Thermal electron attachment to C(60) has been studied by relative rate measurements in a flowing afterglow Langmuir probe apparatus. The rate coefficients of the attachment k(1) are shown to be close to 10(-6) cm(3) s(-1) with a small negative temperature coefficient. These results supersede measurements from the 1990s which led to much smaller values of k(1) with a large positive temperature coefficient suggesting an activation barrier. Theoretical modeling of k(1) in terms of generalized Vogt-Wannier capture theory shows that k(1) now looks more consistent with measurements of absolute attachment cross sections sigma(at) than before. The comparison of capture theory and experimental rate or cross section data leads to empirical correction factors, accounting for "intramolecular vibrational relaxation" or "electron-phonon coupling," which reduce k(1) below the capture results and which, on a partial wave-selected level, decrease with increasing electron energy.
A new high temperature flowing afterglow Langmuir probe (HT-FALP) apparatus is described. A movable Langmuir probe and a four-needle reactant gas inlet were fitted to an existing high temperature flowing afterglow apparatus. The instrument is suitable for study of electron attachment from 300-1200 K, the upper limit set to avoid softening of the quartz flow tube. We present results for two reactions over extended ranges: NF(3) (300-900 K) and CH(3)Cl (600-1100 K). Electron attachment rate constants for NF(3) had been measured earlier using our conventional FALP apparatus. Those measurements were repeated with the FALP and then extended to 900 K with the HT-FALP. CH(3)Cl attaches electrons too weakly to study with the low temperature FALP but reaches a value of approximately 10(-9) cm(3) s(-1) at 1100 K. F(-) is produced in NF(3) attachment at all temperatures and Cl(-) in CH(3)Cl attachment, as determined by a quadrupole mass spectrometer at the end of the flow tube. Future modifications to increase the plasma density should allow study of electron-ion recombination at high temperatures.
We have used a high-temperature flowing-afterglow Langmuir-probe apparatus to measure rate constants for electron attachment to halomethanes which attach electrons very inefficiently at room temperature, yielding Cl(-) ion product. We studied CH(2)Cl(2) (495-973 K), CF(2)Cl(2) (291-1105 K), and CF(3)Cl (524-1004 K) and include our recent measurement for CH(3)Cl (700-1100 K) in the discussion of the electron attachment results. The measured attachment rate constants show Arrhenius behavior in the temperature ranges examined, from which estimates of rate constants at 300 K may be made: CH(2)Cl(2) (1.8x10(-13) cm(3) s(-1)), CH(3)Cl (1.1x10(-17) cm(3) s(-1)), and CF(3)Cl (4.2x10(-14) cm(3) s(-1)), all of which are difficult to measure directly. In the case of CF(2)Cl(2), the room temperature rate constant was sufficiently large to be measured (1.6x10(-9) cm(3) s(-1)). The Arrhenius plots yield activation energies for the attachment reactions: 390+/-50 meV (CH(2)Cl(2)), 124+/-20 meV (CF(2)Cl(2)), 670+/-70 meV (CH(3)Cl), and 406+/-50 meV (CF(3)Cl). Comparisons are made with existing data where available. G3 calculations were carried out to obtain reaction energetics. They show that the parent anions of CH(2)Cl(2) CF(2)Cl(2), CH(3)Cl, and CF(3)Cl are stable, though CH(3)Cl(-) exists only as an electrostatically bound complex.
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