Progress towards far UV (FUV) coatings with enhanced reflectance is invaluable for future space missions, such as LUVOIR. This research starts with the procedure developed to enhance MgF-protected Al reflectance through depositing MgF on a heated aluminized substrate [Quijada et al., Proc. SPIE 8450, 84502H (2012)] and it establishes the optimum deposition temperature of the MgF protective film for Al mirrors with a reflectance as high as ~90% at 121.6 nm. Al films were deposited at room temperature and protected with a MgF film deposited at various temperatures ranging from room temperature to 350°C. It has been found that mirror reflectance in the short FUV range continuously increases with MgF deposition temperature up to 250°C, whereas reflectance decreases at temperatures of 300°C and up. The short-FUV reflectance of mirrors deposited at 250°C only slightly decreased over time by less than 1%, compared to a larger decay for standard coatings prepared at room temperature. Al mirrors protected with MgF deposited at room temperature that were later annealed displayed a similar reflectance enhancement that mirrors protected at high temperatures. MgF and Al roughness as well as MgF density were analyzed by x-ray grazing incidence reflectometry. A noticeable reduction in both Al and MgF roughness, as well as an increase of MgF density, were measured for films deposited at high temperatures. On the other hand, it was found a strong correlation between the protective-layer deposition temperature (or post-deposition annealing temperature) and the pinhole open area in Al films, which could be prevented with a somewhat thicker Al film.

More efficient and stable far ultraviolet (FUV) mirrors will enable future space observatories. Traditional FUV mirrors are based on MgF2-protected Al. AlF3 has been identified as a promising substitute for MgF2 to prevent Al oxidation. Hence, the reflectivity, stability, and morphology of AlF3-protected Al mirrors have been investigated as a function of deposition temperature of the AlF3 film. In this work, it is shown how AlF3 deposition temperature is an important parameter whose optimization ultimately yields valuable throughput enhancement and improved endurance to large storage periods. Al films were deposited at room temperature (RT) and AlF3 protective layers were deposited at temperatures ranging from RT to 350 °C. It was found that the optimum AlF3 deposition temperature was between 200 and 250 °C, yielding the largest FUV reflectance and a better stability of the mirrors, which had been stored in a desiccator environment. Increasing AlF3 deposition temperature resulted in an increase in film density, approaching bulk density at 250 °C. The morphology of Al and AlF3 films as a function of AlF3 deposition temperature was also investigated. The increase in the AlF3 deposition temperature resulted in a decrease of both Al and AlF3 surface roughness and in the growth of the grain width at the AlF3 outer surface. It also resulted in a trend for the prevalent (111) planes of Al nanocrystals to orient parallel to the coating surface.

Polarimetry is a valuable technique to help us understand the role played by the magnetic field of the coronal plasma in the energy transfer processes from the inner parts of the Sun to the outer space. Polarimetry in the far ultraviolet (FUV: 100-200 nm), which must be performed from space due to absorption in terrestrial atmosphere, supplies fundamental data of processes that are governed by the Doppler and Hanle effects on resonantly scattered line-emission. To observe these processes there are various key spectral lines in the FUV, from which H I Lyman α (121.6 nm) is the strongest one. Hence some solar physics missions that have been proposed or are under development plan to perform polarimetry at 121.6 nm, like the suborbital missions CLASP I (2015) and CLASP II (2018), and the proposed solar missions SolmeX and COMPASS and stellar mission Arago. Therefore, the development of efficient FUV linear polarizers may benefit these and other possible future missions. C IV (155 nm) and Mg II (280 nm) are other spectral lines relevant for studies of solar and stellar magnetized atmospheres.High performance polarizers can be obtained with optimized coatings. Interference coatings can tune polarizers at the spectral line(s) of interest for solar and stellar physics. Polarizing beamsplitters consist in polarizers that separate one polarization component by reflection and the other by transmission, which enables observing the two polarization components simultaneously with a single polarizer. They involve the benefit of a higher efficiency in collection of polarization data due to the use of a single polarizer for the two polarization components and they may also facilitate a simplified design for a space polarimeter. We present results on polarizing beamsplitters tuned either at 121.6 nm or at the pair of 155 and 280 nm spectral lines.