Plasmonic nanostructures emerged as an appealing approach for black metal absorbers (BMAs) to provide significant light absorption. We present the simple and rapid fabrication of BMAs using laser-induced forward transfer of silver nanoparticles (AgNPs). Randomly distributed plasmon silver nanostructures at a multiscale were produced simultaneously during laser transfer, providing significant light absorption and antireflection features. The laser-transferred BMAs exhibit excellent absorption capacity of a value over 96% and a minimum reflection of 0.38%. A high scanning speed of 10 m/s was used that can complete the laser-induced forward transfer (LIFT) process within 2 s for a 1 cm2 area. The nearfield light confinement is discussed in terms of the morphology of the obtained nanostructures. Photothermal conversion with macroscale temperature rising was demonstrated for the LIFT process is an effective method for the industrial production of BMAs with excellent absorption capacity.

Laser printing has become a promising alternative for large-scale fabrication of functional devices. Here, laser-induced forward transfer (LIFT) of nanosilica was successfully achieved using a lower-cost nanosecond laser with a center wavelength of 1064 nm. To enhance the light absorption of silica, a small amount of graphene oxide (GO) was added to the fumed silica. Investigations were conducted to give an insight into the role of GO in the LIFT process. Pattern deposition was achieved with a minimum line width of 221 μm. The scattering can be tuned from ~2.5% to ~17.5% by changing the laser fluence. The patternable transparent display based on laser transferred nanosilica (LTNS) film was also demonstrated, showing its capability to deliver information on multiple levels. This LIFT based technique promotes fast, flexible, and low-cost manufacturing of scattering-based translucent screens or patterns for transparent displays.