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Formulating high sensitivity and high resolution EUV Resists is a critical issue gating the adoption of EUV lithography. The ability of resist manufacturers to quickly screen outgassing rates and sensitivity of EUV resists will facilitate faster formulation of a production-ready EUV photoresist. The high power and low cost per watt of the Energetiq EQ-10 light source enables relatively simple designs without complex optics to deliver relevant data efficiently. Because the source operates without electrodes, a significant source of contamination is removed, further simplifying the design of exposure systems.Data will be presented from two prototype exposure systems. The first, in operation at Osaka University, Japan 1 has been used for in-band flood exposure experiments to test resist sensitivity and develop photochemical modeling capability. The second, in operation at SUNY-Albany, 2 integrates exposure/sensitivity with outgassing measurements (GC/MS and RGA) and also allows direct tests of mirror contamination, at power densities near those required for Beta exposure tools. Features of both experiments have been integrated into a commercial device. Details of this tool -the Litho Tech Japan EUVES-7000 system for resist outgassing and exposure -will be presented at this meeting. 3

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