In nanoimprint lithography (NIL) viscous flow in polymeric thin films is the primary mechanism for the generation and the relaxation of the structures. Here we quantify the impact of confinement on the flow rate. Pattern relaxation experiments were carried out above the glass transition temperature as a function of film thickness. The results are adequately fitted by a simple expression for the flow rate valid at all confinements. This expression, based on Newtonian viscosity, should be of use in NIL process design and for the measurement of the rheological properties of confined polymers.

The modal method is well adapted for the modeling of deep-groove, high-contrast gratings of short period, possibly involving metal parts. Yet problems remain in the case of the TM polarization in the presence of metal parts in the corrugations: whereas most of the diffraction features are explained by the interplay of an astonishingly small number of true propagating and low-order evanescent modes, the exact solution of the diffraction problem requires the contribution of two types of evanescent modes that are usually overlooked. We investigate the nature and the role of these modes and show that metal gratings can be treated exactly by the modal method.

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