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Fluoride thin films for 193-nm lithography were deposited by three different types of RF magnetron sputtering. Systematic analysis of the relation between optical properties and deposition conditions of these thin films is discussed.

The new binary chromium sulfide CrS 3 has been synthesized by reaction of Cr 3 S 4 and sulfur mixtures at 800 °C and 13 GPa. CrS 3 crystallizes in an orthorhombic unit cell with a = 4.6742(7) Å, b = 5.7315(8) Å, c = 10.603(2) Å, and V = 284.873(4) Å 3 . It has a novel structure composed of Cr 2 S 10 edge-shared octahedral dimers, which share all of their corners to form a three-dimensional structure. All of the sulfur atoms form S 2 2− disulfide ions with a S−S distance of 2.063(5) or 2.068(8) Å. The structure of CrS 3 is a derivative of the crystal structure of marcasite FeS 2 , in which one in three metal sites of the marcasite structure is vacant in the CrS 3 structure.

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