No abstract

Photoluminescence (PL) at 1.54 μm of erbium-doped Si1−yCy alloys grown by molecular beam epitaxy (MBE) has been analyzed depending on sample temperature, excitation density, and growth conditions. Erbium activation raises with increasing incorporation of substitutional carbon compared to interstitial carbon. For [Er]=4.5×1019 cm−3 and y=0.1% maximum PL output at 1.54 μm was achieved for growth temperatures at 430 °C. Additional annealing could further enhance PL intensity at 1.54 μm. For increasing sample temperature a decrease of PL intensity with two characteristic activation energies around 100 and 10–20 meV is observed, which results in quenching of PL intensity at lower temperatures for Si:Er:C layers compared to Si:Er:O layers. PL spectra show different fine structure for oxygen and carbon codoping by MBE or ion implantation, higher efficiency, and lower PL background for MBE-grown samples in contrast to ion-implanted layers.

We report about spatially resolved experiments on self-assembled InGaAs quantum dots. Single quantum dots can be investigated by using STM-induced luminescence spectroscopy. The quantum dot occupancy can be increased via the STM tip current, which results in state filling and therefore in the onset of discrete excited state luminescence. In the limit of low injection currents, a single emission line from the ground state of the dot is observed. Using near-field spectroscopy through shadow masks, we have investigated the optical properties of single self-assembled InGaAs quantum dots as a function of occupancy and magnetic field. This allows us to fully resolve diamagnetic/orbital effects, Zeeman splitting, and to determine manybody-corrections. Photoluminescence excitation spectra further reveal a strong contribution of phonon assisted processes in quantum dot absorption.

Efficient light emission at 1.54μ m from Er in Si excited by hot electron injection through thin suboxide layers Hot electron impact excitation cross-section of Er 3+ and electroluminescence from erbium-implanted silicon metal-oxide-semiconductor tunnel diodes Mechanism and performance of forward and reverse bias electroluminescence at 1.54 μm from Er-doped Si diodes