We report conformal, epitaxial growth of GaP layers on arrays of Si microwires. Silicon wires grown using chlorosilane chemical vapor deposition were coated with GaP grown by metal-organic chemical vapor deposition. The crystalline quality of conformal, epitaxial GaP/Si wire arrays was assessed by transmission electron microscopy and x-ray diffraction. Hall measurements and photoluminescence show p-and n-type doping with high electron mobility and bright optical emission. GaP pn homojunction diodes on planar reference samples show photovoltaic response with an open circuit voltage of 660 mV.

Si wire arrays have recently demonstrated their potential as photovoltaic devices [1][2][3]. Using these arrays as a base, we consider a next generation, multijunction wire array architecture consisting of Si wire arrays with a conformal GaNxP1-x-yAsy coating. Optical absorption and device physics simulations provide insight into the design of such devices. In particular, the simulations show that much of the solar spectrum can be absorbed as the angle of illumination is varied and that an appropriate choice of coating thickness and composition will lead to current matching conditions and hence provide a realistic path to high efficiencies. We have previously demonstrated high fidelity, high aspect ratio Si wire arrays grown by vaporliquid-solid techniques, and we have now successfully grown conformal GaP coatings on these wires as a precursor to considering quaternary compound growth. Structural, optical, and electrical characterization of these GaP/Si wire array heterostructures, including x-ray diffraction, Hall measurements, and optical absorption of polymer-embedded wire arrays using an integrating sphere were performed. The GaP epilayers have high structural and electrical quality and the ability to absorb a significant amount of the solar spectrum, making them promising for future multijunction wire array solar cells.