The effect of the addition of an external source of correlated noise on\ud the electron transport in silicon MOS inversion layer, driven by a static\ud electric field, has been investigated. The electron dynamics is simulated by\ud a Monte Carlo procedure which takes into account non-polar optical and\ud acoustic phonons. In our modelling of the quasi-two-dimensional electron\ud gas, the potential profile, perpendicular to the MOS structure, is assumed\ud to follow the triangular potential approximation. We calculate the changes\ud in both the autocorrelation function and the spectral density of the velocity\ud fluctuations, at different values of noise amplitude and correlation time.\ud The findings indicate that, the presence of a fluctuating component added\ud to the static electric field can affect the total noise power, i.e. the variance\ud of the electron velocity fluctuations. Moreover, this effect critically depends\ud on both the amplitude of the driving electric field and the noise parameters

We study the intrinsic noise in n-type Si crystals operating under high-frequency periodic electric fields. To simulate the dynamics of electrons in the bulk, by taking into account the main details of band structure, scattering processes, as well as heating effects, a Monte Carlo approach is used. The noise properties are investigated by computing the velocity fluctuations correlation function, its spectral density, and the total noise power for different values of the amplitude and frequency of the driving field. We show that the noise features are significantly affected by the electric field amplitude and frequency and discuss their peculiarities in comparison with those exhibited in the static field case. We find the integrated spectral density, i. e. the total noise power, monotonically reducing its value with the increase of the field frequency, for each amplitude of the applied field. These results can be considered a first step towards a full understanding of the physical characteristics of electronic noise in Si devices, driven by periodic electric fields, relevant, for example, for harmonic generation purposes.

We study the intrinsic noise in n-type Si crystals operating under high-frequency periodic electric fields. To simulate the dynamics of electrons in the bulk, by taking into account the main details of band structure, scattering processes, as well as heating effects, a Monte Carlo approach is used. The noise properties are investigated by computing the velocity fluctuations correlation function, its spectral density, and the total noise power for different values of the amplitude and frequency of the driving field. We show that the noise features are significantly affected by the electric field amplitude and frequency and discuss their peculiarities in comparison with those exhibited in the static field case. We find the integrated spectral density, i. e. the total noise power, monotonically reducing its value with the increase of the field frequency, for each amplitude of the applied field. These results can be considered a first step towards a full understanding of the physical characteristics of electronic noise in Si devices, driven by periodic electric fields, relevant, for example, for harmonic generation purposes.

Recently, electrical injection of spin polarization in n-type and p-type silicon up to room-temperature has been experimentally carried out. Despite of these promising experimental results, a comprehensive theoretical framework concerning the influence of transport conditions on the spin depolarization process in silicon structures, in a wide range of values of temperature, doping concentration and amplitude of external fields, is still in a developing stage. In this contribution we use a semiclassical multiparticle Monte Carlo approach to simulate the electron transport and spin dynamics in lightly doped n-type Si crystals and numerically calculate the spin lifetimes of drifting electrons. Spin flipping is taken into account through the Elliot-Yafet mechanism, which is dominant in group IV materials. We discuss the influence of different intravalley and intervalley phonon interactions in the spin relaxation process during the spin transport. Our findings are in good agreement with those obtained by using different theoretical approaches. Moreover, our Monte Carlo predictions, in ranges of temperature and field amplitude yet unexplored, can guide future experimental studies towards a more effective design of room-temperature silicon based spintronic-devices.

Recently, electrical injection of spin polarization in n-type and p-type silicon up to room-temperature has been experimentally carried out. Despite of these promising experimental results, a comprehensive theoretical framework concerning the influence of transport conditions on the spin depolarization process in silicon structures, in a wide range of values of temperature, doping concentration and amplitude of external fields, is still in a developing stage. In this contribution we use a semiclassical multiparticle Monte Carlo approach to simulate the electron transport and spin dynamics in lightly doped n-type Si crystals and numerically calculate the spin lifetimes of drifting electrons. Spin flipping is taken into account through the Elliot-Yafet mechanism, which is dominant in group IV materials. We discuss the influence of different intravalley and intervalley phonon interactions in the spin relaxation process during the spin transport. Our findings are in good agreement with those obtained by using different theoretical approaches. Moreover, our Monte Carlo predictions, in ranges of temperature and field amplitude yet unexplored, can guide future experimental studies towards a more effective design of room-temperature silicon based spintronic-devices.