Integrating graphene with plasmonic nanostructures results in multifunctional hybrid systems with enhanced performance for numerous applications. In this work, we take advantage of the remarkable mechanical properties of graphene to combine it with scalable 3D plasmonic nanostructured silicon substrates, which enhance the interaction of graphene with electromagnetic radiation. Large areas of femtosecond laser-structured arrays of silicon nanopillars, decorated with gold nanoparticles, are integrated with graphene, which conforms to the substrate nanotopography. We obtain Raman spectra at 488, 514, 633, and 785 nm excitation wavelengths, spanning the entire visible range. For all excitation wavelengths, the Raman signal of graphene is enhanced by 2-3 orders of magnitude, similarly to the highest enhancements measured to date, concerning surface-enhanced Raman spectroscopy (SERS) of graphene on plasmonic substrates. Moreover, in contrast to traditional deposition and lithographic methods, the fabrication method employed here relies on single-step, maskless, cost-effective, rapid laser processing of silicon in water, amenable to large-scale fabrication. Finite-difference time-domain 3 simulations elucidate the advantages of the 3D topography of the substrate. Conformation of graphene to the Au-decorated silicon nanopillars enables graphene to sample near fields from an increased number of nanoparticles. Due to synergistic effects with the nanopillars, different nanoparticles become more active for different wavelengths and locations on the pillars, providing broadband enhancement. Nanostructured plasmonic silicon is a promising platform for integration with graphene and other 2D materials, for next-generation applications of large-area hybrid nanomaterials in the fields of sensing, photonics, optoelectronics, and medical diagnostics.

We developed thin films of blends of polystyrene (PS) with the thermoresponsive polymer poly(N‐isopropylacrylamide) (PNIPAM) (PS/PNIPAM) and its diblock copolymer polystyrene‐b‐poly(N‐isopropylacrylamide) (PS/PS‐b‐PNIPAM) in different blend ratios, and we study their surface morphology and thermoresponsive wetting behavior. The blends of PS/PNIPAM and PS/PS‐b‐PNIPAM are spin‐casted on flat silicon surfaces with various drying conditions. The surface morphology of the films depends on the blend ratio and the drying conditions. The PS/PS‐b‐PNIPAM films do not show an increase in their water contact angles with temperature, as it is expected by the presence of the PNIPAM block. All PS/PNIPAM films show an increase in the water contact angle above the lower critical solution temperature of PNIPAM, which depends on the ratio of PNIPAM in the blend and is insensitive to the drying conditions of the films. The difference between the wetting behavior of PS/PS‐b‐PNIPAM and PS/PNIPAM films is due to the arrangement of the PNIPAM chains in the film. © 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2019, 57, 670–679

No abstract