With device fabrication costs escalating dramatically each year and competition intensifying on a global level, chipmakers are seeking alternative equipment and fab designs to obtain an economic and technical edge. Nowhere is this more apparent than in the lithography area where equipment decisions greatly influence both the cost and performance of the production facility.This economic incentive has led to extensive use of intermix lithography. With this approach, less costly, more productive systems can be used to pattern the noncritical layers while saving the expensive, advanced performance tools for the critical levels. In the past, the majority of intermixing has occurred between steppers and projection aligners. However, due to increasingly complex device designs, intermix applications have expanded to include 1:1 steppers for noncritical levels, and reduction steppers for critical layers. The economic advantages inherent in this methodology are substantial. Productivity is increased and costper-wafer processed reduced for even the most sophisticated ICs. This paper will describe a lithographic intermix process for a high volume, 1.tm CMOS process using Ultratech 1:1 and Nikon 5:1 steppers. 0-81 94-0829-8/92/$4.OO SPIE Vol. 1674 Optical/Laser Microlithography V (1992) / 559 Downloaded From: http://proceedings.spiedigitallibrary.org/ on 06/16/2016 Terms of Use: http://spiedigitallibrary.org/ss/TermsOfUse.aspx

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This paper describes the development of an RStudio (now known as Posit) dashboard derived from the Integrated Postsecondary Educational Data System, the United States Census Bureau, and the Bureau of Labor Statistics and provides the user with institutional, community, and career information of IPEDS reporting higher education institutions in the United States and its territories. With this dashboard, users can select and learn about institutions, explore enrollment trends and demographics, compare outcomes, and correlate community and institutional variables. Users can also link degrees to career projections and wages. This paper explains how the dashboard was developed with examples of R programming language.

In the last year, the Trinity River Authority has installed two bioscrubbers at its Central Regional Wastewater System Wastewater Treatment Plant. One treats foul air from a gravity thickener supernatant pump station; the other treats a unique foul air stream from a combined sludge stripping/conditioning tank. Both scrubbers have performed well despite H 2 S loads considerably higher than originally projected. Operating costs are significantly lower than would have been projected for chemical scrubbers. This presentation discusses costs, removal efficiencies, operational considerations, and general applicability of bioscrubbers in municipal wastewater treatment.

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