The plasmonic properties of arrays of supported Al nanodisks, fabricated by hole-mask colloidal lithography (HCL), are analyzed for the disk diameter range 61-492 nm at a constant disk height of 20 nm. Strong and well-defined (UV-vis-NIR) localized surface plasmon resonances are found and experimentally characterized with respect to spectral peak positions, peak widths, total cross sections, and radiative and nonradiative decay channels. Theoretically, the plasmon excitations are described by electrostatic spheroid theory. Very good qualitative and quantitative agreement between model and experiment is found for all these observables by assuming a nanoparticle embedded in a few nanometer thick homogeneous (native) aluminum oxide shell. Other addressed aspects are: (i) the role of the strong interband transition in Al metal, located at 1.5 eV, for the plasmonic excitations of Al nanoparticles, (ii) the role of the native oxide layer, and (iii) the possibility of using the plasmon excitation as an ultrasensitive, remote, real-time probe for studies of oxidation/corrosion kinetics in metal nanoparticle systems.

The occurrence of plasmon resonances in thin (~20 nm) Al and Au films, perforated with nanoholes, was studied. In both metals, two plasmon resonances were observed: (i) A surface plasmon polariton mode associated with a maximum in extinction and (ii) a localized resonance in the nanohole associated with a minimum in extinction. By varying the diameter of the nanoholes, the scaling of the peak positions of the plasmon resonances was determined as a function of hole diameter. In the large nanohole limit, the plasmon peak positions depend only on the nanohole diameter being independent of the material. On the other hand, for small nanoholes the plasmon peak positions are material and size dependent. In contrast to Al films where the localized plasmons can be excited from the near-IR to the UV, no plasmon resonances were observed for Au at energies above the interband threshold (2.4 eV). The interaction between a distinct interband transition in Al at 1.5 eV and the localized plasmon resonance is considered in detail. We observe for the first time experimentally a noncrossing behavior of the interband transition and the localized plasmon resonance. The energy (size) dependence of surface plasmon peak width, being a measure for the decay/damping of the latter, is very different for the two metals. This can be explained by considering the different decay mechanisms active in the two metals. Apart from these basic plasmonics results, we test the potential of using the shifts of the plasmon resonances in perforated Al films to follow the atmospheric oxidation/corrosion kinetics of Al. The results are quantified by model calculations. The obtained kinetic law for the oxide growth is in good agreement with a previous XPS study on plain Al films. This suggests that the nanohole-induced plasmon resonances can be a sensitive and simple measure for Al corrosion and metal corrosion in general.

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Inspired by the promising thermoelectric properties of phase-separated half-Heusler materials, we investigated the influence of electron doping in the n-type Ti 0.3Àx Zr 0.35 Hf 0.35 NiSn compound. The addition of Nb to this compound led to a significant increase in its electrical conductivity, and shifted the maximum Seebeck coefficient to higher temperatures owing to the suppression of intrinsic carriers. This resulted in an enhancement of both the power factor a 2 s and figure of merit, zT. The applicability of an average effective mass model revealed the optimized electron properties for samples containing Nb.There is evidence in the literature that the average effective mass model is suitable for estimating the optimized carrier concentration of thermoelectric n-type half-Heusler compounds.