We studied the atomic and electronic structures of ultrathin Bi(111) films grown on Bi(2)Te(3) by means of angle-resolved photoemission, first-principles calculations, and low-energy electron diffraction. These Bi films were found to be strained due to the influence of the substrate. Accordingly, the band structure is affected and Bi undergoes a topological phase transition; it is shown that the Z(2) topological invariant in three dimensions switches from +1 (trivial) to -1 (nontrivial or topological). This was clearly confirmed from the change in the surface-state dispersion near the Fermi level. Our discovery offers a method to produce novel topological systems from simple materials.

We performed in situ magnetotransport measurements on ultrathin Bi(111) films [4-30 bilayers (BLs), 16-120 Å thick] to elucidate the role of bulk or surface states in the transport phenomena. We found that the temperature dependence of the film conductivity shows no thickness dependence for the 6-16 BL films and is affected by the electron-electron scattering, suggesting surface-state dominant contribution. In contrast, the weak antilocalization effect observed by applying a magnetic field shows clear thickness dependence, indicating bulk transport. This apparent inconsistency is explained by a coherent bulk-surface coupling that produces a single channel transport. For the films thicker than 20 BLs, the behavior changes drastically which can likely be interpreted as a bulk dominant conduction.

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Topological insulators are insulating materials but have metallic edge states with peculiar properties. They are considered to be promising for the development of future low energy consumption nano-electronic devices. However, there is a major problem: Naturally grown materials are not truly insulating owing to defects in their crystal structure. In the present study, we have examined the electronic structure and transport properties of topological insulator ultrathin Bi2Te3 films by angle-resolved photoemission spectroscopy and in situ transport measurements. To realize a truly bulk insulating film, we tried to tune the Fermi-level position using two methods. The first of these, i.e., changing the Si substrate temperature during film growth (350–450 K) to reduce the defects in the grown films, had some effect in reducing the bulk residual carriers, but we could not fabricate a film that showed only the surface states crossing the Fermi level. The second method we employed was to incorporate Pb atoms during film growth since Pb has one less electron than Bi. When the films were grown at around 350 K, we observed a systematic shift in the Fermi level and obtained a bulk insulating film, although it was not possible to move the Dirac point just at the Fermi level. The change in the measured film conductivity was consistent with the shift in the Fermi level and suggested the detection of the surface-state conductivity. For films grown at a higher substrate temperature (450 K), the Fermi level could be tuned only slightly and a bulk n-type film was obtained. Pb incorporation changes the shape of the Dirac cone, suggesting the formation of a stoichiometric ternary alloy of Bi, Pb, and Te, which is another topological insulator.