Manufacturing a low‐resistive Ohmic metal contact on p‐type InP crystals for various applications is a challenge because of the Fermi‐level pinning via surface defects and the diffusion of p‐type doping atoms in InP. Development of wet‐chemistry treatments and nanoscale control of p‐doping for InP surfaces is crucial for decreasing the device resistivity losses and durability problems. Herein, a proper combination of HCl‐based solution immersion, which directly provides an unusual wet chemical‐induced InP(100)c(2 × 2) atomic structure, and low‐temperature Mg‐surface doping of the cleaned InP before Ni‐film deposition is demonstrated to decrease the contact resistivity of Ni/p‐InP by the factor of 10 approximately as compared to the lowest reference value without Mg. Deposition of the Mg intermediate layer on p‐InP and postheating of Mg/p‐InP at 350 °C, both performed in ultrahigh‐vacuum (UHV) chamber, lead to intermixing of Mg and InP elements according to X‐ray photoelectron spectroscopy. Introducing a small oxygen gas background (O2 ≈ 10−6 mbar) in UHV chamber during the postheating of Mg/p‐InP enhances the indium outdiffusion and provides the lowest contact resistivity. Quantum mechanical simulations indicate that the presence of InP native oxide or/and metal indium alloy at the interface increases In diffusion.

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In this paper, a new method for determination of void fraction in surface aeration process is presented and discussed. The proposed method is based on the image processing technique. The experimental setup has been designed to create various surface aeration conditions in the water. Void fraction has been calculated for the wide range of water height, impeller immersion depth and rotational speed. Experiments have been performed in an open cubic tank with side length of 60 cm, equipped with one Rushton disk turbine. Moreover, the void fraction has been measured with level gauge method. The results showed that the image processing technique provides more accurate results than the level gauge measurements for void fraction calculation in surface aeration especially in low void fraction aeration. In addition, the experimental data revealed that increase in impeller immersion depth and rotational speed increase void fraction and oxygen transfer rate in surface aeration process.

This paper reports tests on a lab-scale surface aeration vessel was equipped with a Rushton turbine to examine its performance in terms of standard aeration efficiency (SAE), mixing time, and void fraction characteristics. These characteristics were investigated by tests using variations of rotor speed, impeller immersion depth, and water level. Results showed that variation of impeller immersion depth had a greater effect on the SAE compared to variation of water level. Moreover, the SAE increased with rotor speeds up to about 150 to 200 rpm and then decreased. In addition, void fraction improved by impeller immersion depth and rotor speed enhancement; however, mixing time and power number were reduced as rotor speed increased. According to the response surface methodology statistical optimizations, optimum values for rotor speed, impeller immersion depth, and water level were 168.90 rpm, 25 mm, and 30 cm, respectively, to achieve the maximum value of SAE.

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