An analytical model, with incorporation of transferred-electron effect, for drain-current characteristics of AlGaN/GaN heterostructure field-effect transistors (HFETs) is presented. The transferred-electron effect is often neglected in modeling the drain-current of III-V HFETs. The broad steady-state electron drift-velocity overshoot of GaN in comparison to other direct semiconductors such as GaAs and InP, in addition to the larger difference between the peak and saturation drift-velocity, and the wider band gap of this semiconductor suggest the importance of the incorporation of transferred-electron effect (i.e., steady-state drift-velocity overshoot) in modeling the drain-current of these devices. Simulation results are compared with the results of the adoption of a saturating drift transport model, which has been recently used in modeling the drain-current of these devices. Comparisons between the two models demonstrate the importance of the consideration of transferred-electron effect, especially as the Ohmic contact quality is improved.
Two new physical designs for sensors that can be used for strain measurement in large structures such as bridges, wind turbines, or airplanes are presented. While the proposed sensor designs focus on high sensitivity, they are based on simple operating principle of comb-drive differential variable capacitances and chevron displacement amplification. The chevron beams convert small amount of applied strains to measurable changes in capacitance of comb fingers. The design of the structures enables simple fabrication methods for the realization of the sensors. Two designs are proposed with the first design can also be used as a sensitive resonant strain sensor. Device performances are validated both by analytical solutions and also by finite element method simulations. The obtained nominal capacitance is 25 fF, with sensitivities of 13 aF and 2.7 aF per microstrain (µε) while demonstrating maximum strain range of ±1000 µε and ±1800 µε, respectively for the first and second designs. As a resonant strain sensor, the first design exhibits a sensitivity of about 8.6 Hz/µε.
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