Thin
films of MoS2 bilayer nanoflakes, which are predominantly
a single flake thick and with flakes in edge-to-edge contact, have
been produced via self-assembled tiling at the planar interface between
two immiscible liquids. Films of several square centimeters extent
can be produced with a total covered area approaching 90% and over
70% of the film covered by single flakes without overlap. Films produced
through liquid/liquid assembly are shown to produce a lower uncovered
area fraction and more uniform thickness when compared with films
of similar areal coverage produced by the “top-down”
techniques of spin coating and spray coating. Statistical analysis
of flake coverage data, measured by atomic force microscopy (AFM),
shows that liquid/liquid assembly produces a distinctly different
variation in film thickness than conventional top-down deposition.
This supports the hypothesis that the two-dimensional (2D) confinement
of liquid/liquid assembly produces more uniform films. Demonstrator
field-effect transistors (FETs) manufactured from the films exhibit
mobility and on/off current ratios of 0.73 cm2 V–1 s–1 and 105, respectively, comparable
to FETs of similar layout and chemical vapor deposition (CVD)-grown
or mechanically cleaved single-crystal MoS2 channel material.
This work demonstrates the use of liquid/liquid interfaces as a useful
tool for the self-assembly of high-performance thin-film devices made
from dispersions of 2D materials.
Optical flow cell reflectometry was used to study the adsorption of poly(vinylpyrrolidone) (PVP) to a silica surface and the subsequent surfactant adsorption and polymer desorption upon exposure to the anionic surfactant sodium dodecyl sulfate (SDS). We have studied these effects as a function of pH and surfactant concentration, but also for two different methods of silica preparation, O2 plasma and piranha cleaning. As a function of pH, a plateau in the amount adsorbed of ∼0.6 mg/m(2) is observed below a critical pH, above which the adsorption decreases to zero within 2-3 pH units. An increase in pH leads to dissociation of surface OH groups and a decreased potential for hydrogen bonding between the polymer and surface. For the plasma- and piranha-cleaned silica, the critical pH differs by 1-2 pH units, a reflection of the much larger amount of surface OH groups on piranha-cleaned silica (for a given pH). Subsequent rinsing of the adsorbed layer of PVP with an SDS solution leads to total or partial desorption of the PVP layer. Any remaining adsorbed PVP then acts as an adsorption site for SDS. A large difference between plasma- and piranha-cleaned silica is observed, with the PVP layer adsorbed to plasma-cleaned silica being much more susceptible to desorption by SDS. For a plasma-cleaned surface at pH 5.5, only 30% of the originally adsorbed PVP is remaining, while for piranha-cleaned silica, the pH can be increased to 10 before a similar reduction in the amount of adsorbed PVP is seen. For a given pH, piranha-cleaned silica has a higher surface charge, leading to a smaller amount of adsorbed SDS per PVP chain on a piranha-cleaned surface compared to a plasma-cleaned surface under identical conditions. In that way, the high negative surface charge makes desorption by negatively charged SDS more difficult. The high surface charge thus protects the neutral polymer from surfactant-mediated desorption.
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