An improved version of spectroscopic imaging ellipsometry is described for accurate reconstruction of two-dimensional thin film thickness. A digital light processing projector enables to illuminate selective area of the back focal plane of the objective lens so that the angle of incidence and the polarization state of the light source vary depending on the area of the back focal plane to be illuminated. By combining multiple images of the object plane obtained at different polarization state, every pixel in the field of view has their own ellipsometric parameters, therefore, the reconstruction of two-dimensional thin film thickness is possible. Because the proposed ellipsometry system has a co-axial optical structure in which the objective lens is arranged in the normal direction to the measurement target, the spatial resolution is improved due to the application of high magnitude objective lens. In addition, the spectroscopic analysis can be conducted using a number of band-pass filters which have each central wavelength. The effect of the proposed method on the thin film thickness measurement was evaluated by comparing the experimental result with a topographic profile obtained using a commercial AFM.