Multiplexed optical recording provides an unparalleled approach to increasing the information density beyond 10(12) bits per cm(3) (1 Tbit cm(-3)) by storing multiple, individually addressable patterns within the same recording volume. Although wavelength, polarization and spatial dimensions have all been exploited for multiplexing, these approaches have never been integrated into a single technique that could ultimately increase the information capacity by orders of magnitude. The major hurdle is the lack of a suitable recording medium that is extremely selective in the domains of wavelength and polarization and in the three spatial domains, so as to provide orthogonality in all five dimensions. Here we show true five-dimensional optical recording by exploiting the unique properties of the longitudinal surface plasmon resonance (SPR) of gold nanorods. The longitudinal SPR exhibits an excellent wavelength and polarization sensitivity, whereas the distinct energy threshold required for the photothermal recording mechanism provides the axial selectivity. The recordings were detected using longitudinal SPR-mediated two-photon luminescence, which we demonstrate to possess an enhanced wavelength and angular selectivity compared to conventional linear detection mechanisms. Combined with the high cross-section of two-photon luminescence, this enabled non-destructive, crosstalk-free readout. This technique can be immediately applied to optical patterning, encryption and data storage, where higher data densities are pursued.
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The current nanofabrication techniques including electron beam lithography provide fabrication resolution in the nanometre range. The major limitation of these techniques is their incapability of arbitrary three-dimensional nanofabrication. This has stimulated the rapid development of far-field three-dimensional optical beam lithography where a laser beam is focused for maskless direct writing. However, the diffraction nature of light is a barrier for achieving nanometre feature and resolution in optical beam lithography. Here we report on three-dimensional optical beam lithography with 9 nm feature size and 52 nm two-line resolution in a newly developed two-photon absorption resin with high mechanical strength. The revealed dependence of the feature size and the two-line resolution confirms that they can reach deep sub-diffraction scale but are limited by the mechanical strength of the new resin. Our result has paved the way towards portable three-dimensional maskless laser direct writing with resolution fully comparable to electron beam lithography.
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