The purpose of this paper is to study the MOSFET stress sensor behaviors and to develop the related measurement methodology. With the newly developed technology, the piezoresistance coefficients of the MOSFET were extracted, and the strain and temperature effect induced MOSFET characteristics were obtained. The results of this study can be used to adjust the chip structure in a packaging so that the optimal packaging technology and material can be chosen, and accuracies of the numerical analysis can be verified through experimental data with the new technology studied in this paper.

No abstract