We demonstrate a bottom-up approach to fabricate nanoline structures using self-assembled monolayer (SAM) modified substrates to selectively prevent nucleation during atomic layer deposition (ALD). Low-energy (≤5 kV) electron-beam lithography (EBL) was used to modify the hydrophobic functional groups (−CH 3 ) of octadecyltrichlorosilane (OTS) SAM to hydrophilic species (e.g., −COOH), which allows chemisorption of the titanium isopropoxide (TTIP) and water to initiate titanium oxide (TiO 2 ) nucleation. TiO 2 thin films were selectively deposited on the OTS molecules which were properly functionalized or patterned. We systematically investigate the effects of e-beam dose and accelerating voltage on selective TiO 2 deposition with nanoline patterns. The results indicate that the former parameter determines the resolution of individual line width, while the latter one is attributed to the minimum pitch dimension of dense line patterns achievable. Using the optimal e-beam parameters, i.e., accelerating voltages of 1−2 kV and a line dose of 10 nC/cm, TiO 2 nanolines with a maximum resolution of 30 nm and a minimum pitch of 50 nm were achieved. This study offers a new approach to fabricate closepacked nanopatterns for IC devices without any challenging etching processes.
In this study the author explores the level of use of evidence-based practice and the extent of barriers to research utilization in rural practice settings. Ninety-one social work field instructors from the rural areas of Southeast Ohio reported moderate use of evidence-based practice in their treatment process. The majority of field instructors also identified significant barriers to research utilization in practice. In addition, the use of evidence-based practice was associated with barriers to utilize research in the areas of field instructors' characteristics, organizational settings and limits, and communication. Implications include suggestions for enhancing evidence-based practice in rural settings.
In this study, we investigate 7-octenytrichlorosilane (7-OTS) multilayers and relevant organic-inorganic hybrid nano-laminates fabricated using ozone (O 3 ) based molecular-atomic layer deposition (MALD). Highly concentrated O 3 gas introduced into the MALD chamber converts alkene (ÀC¼C) terminal groups of 7-OTS molecules into carboxylic (ÀCOOH) groups. Trimethylaluminum (TMA) is applied to form a linker to construct multilayers of the OTS molecules. Aluminum oxide (Al 2 O 3 ) and zinc oxide (ZnO) are embedded between the organic layers to form an organic-inorganic hybrid nano-laminate structure. Fourier transform infrared spectroscopy (FTIR), water contact angle measurement, ellipsometry, and transmission electron microscopy (TEM) are used to elucidate the growth mechanism.
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