: The effectiveness of applying a high-frequency, low-energy, reactive gas plasma for the removal of hydrocarbon contamination from specimens and components for electron microscopy has been investigated with a variety of analytical techniques. Transmission electron microscopy (TEM) analysis of specimens that have been plasma cleaned shows an elimination of the carbonaceous contamination from the specimen. With extended cleaning times the removal of existing carbon contamination debris due to previously conducted microanalysis is shown. Following plasma cleaning, specimens may be examined in the electron microscope for several hours without exhibiting evidence of recontamination. The effectiveness of plasma cleaning is not limited to applications for TEM specimens. Scanning electron microscopy (SEM) specimens that have been plasma cleaned likewise show an elimination of carbonaceous contamination. Furthermore, other electron microscopy parts and accessories, such as aperture strips, specimen clamping rings, and Wehnelts, among others, can benefit from plasma cleaning.

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Subnanometer scale tribological properties of nitrogen containing carbon coatings used in magnetic storage devices J.Continuity and topography of ultrathin diamond-like carbon films characterized by scanning electron microscopy/energy dispersive x-ray analysis and atomic force microscopy Carbon nitride films were grown on silicon and hard disk substrates using pulsed dc magnetron sputtering in a single-cathode deposition system. Substrates were mounted on a specially designed holder that allowed 45°tilt angle and substrate rotation about the surface normal up to 20 rpm. The influence of substrate bias, substrate tilt, and rotation on film growth and properties was studied. Films with the lowest rms surface roughness and corrosion performance were obtained at Ϫ100 V substrate bias with substrate tilt and rotation. Atomic force microscope scans over 10ϫ10 m 2 sampling areas showed that 50 nm thick CN x films prepared under these conditions have roughness almost four times lower than those prepared without substrate tilt and rotation. We observed a twofold reduction in corrosion damage for hard disk substrates with 1 nm thick CN x overcoats deposited with substrate tilt and rotation. This improved performance is likely a result of more efficient and uniform momentum transfer parallel to the surface during deposition in this configuration.

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