High resolution Laplace deep level transient spectroscopy (LDLTS) has been used to characterise deep electronic states in the band gap of polycrystalline p‐type diamond. The thin diamond films were grown by the hot‐filament chemical vapour deposition (HFCVD) technique on p‐type and n‐type Si for the formation of the Schottky and p–n diodes respectively. The B concentration in the diamond films ranged from 7 × 1018 cm–3 to 7 × 1021 cm–3. Conventional capacitance DLTS showed a fairly narrow peak at about 180 K from the diamond grown on p‐type Si, but further analysis with LDLTS shows that this peak originates from a complex defect with up to three hole emission rates. In the case of the Schottky diode, these emission rates do not vary much with temperature which indicates that they may be due to the presence of an extended defect, where the valence band itself is changing its profile as the traps capture more carriers. LDLTS of a similar trap in the diamond grown on n‐type Si also shows three emission rates, which do not vary as expected with temperature. The results are discussed in terms of defects existing in the strain fields of grain boundaries, and exhibiting non point‐defect like properties. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

We have carried out DLTS in highly doped p+n Ultra Shallow Junctions (USJ) in Si formed by ion implantation. The samples were implanted either with a 10keV or a 5keV B implant at a dose of 5*1015cm15. The 10keV sample was also implanted with P and the 5keV samples were implanted with P and increasing doses of As to simulate an USJ in an n-well. Due to the high P and/or As implant doses, it was observed that a band offset also exists between the n-type implanted region and the n-type starting material. Therefore these samples contain another depletion region apart from the expected p+n depletion region. However, the electric fields in these regions act in opposite directions assisting the profiling of different regions after careful selection of biasing conditions. A deep state is observed in the n-type region at EC-0.34eV which has a complex Laplace DLTS signature, which has arisen due to the implantation process.

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