The mechano-bactericidal activity of nanostructured surfaces has become the focus of intensive research toward the development of a new generation of antibacterial surfaces, particularly in the current era of emerging antibiotic resistance. This work demonstrates the effects of an incremental increase of nanopillar height on nanostructure-induced bacterial cell death. We propose that the mechanical lysis of bacterial cells can be influenced by the degree of elasticity and clustering of highly ordered silicon nanopillar arrays. Herein, silicon nanopillar arrays with diameter 35 nm, periodicity 90 nm and increasing heights of 220, 360, and 420 nm were fabricated using deep UV immersion lithography. Nanoarrays of 360-nm-height pillars exhibited the highest degree of bactericidal activity toward both Gram stain-negativePseudomonas aeruginosaand Gram stain-positiveStaphylococcus aureusbacteria, inducing 95 ± 5% and 83 ± 12% cell death, respectively. At heights of 360 nm, increased nanopillar elasticity contributes to the onset of pillar deformation in response to bacterial adhesion to the surface. Theoretical analyses of pillar elasticity confirm that deflection, deformation force, and mechanical energies are more significant for the substrata possessing more flexible pillars. Increased storage and release of mechanical energy may explain the enhanced bactericidal action of these nanopillar arrays toward bacterial cells contacting the surface; however, with further increase of nanopillar height (420 nm), the forces (and tensions) can be partially compensated by irreversible interpillar adhesion that reduces their bactericidal effect. These findings can be used to inform the design of next-generation mechano-responsive surfaces with tuneable bactericidal characteristics for antimicrobial surface technologies.

Chemical vapor deposition (CVD) is widely considered to be the most economically viable method to produce graphene for high-end applications. However, this deposition technique typically yields undesired grain boundaries in the graphene crystals, which drastically increases the sheet resistance of the layer. These grain boundaries are mostly caused by the polycrystalline nature of the catalytic template that is commonly used. Therefore, to prevent the presence of grain boundaries in graphene crystals, it is crucial to develop a large scale, single-crystalline template. In this paper, we demonstrate the deposition of a single-crystalline Cu(111) film on top of a 2″ sapphire wafer. The crystalline quality of the Cu(111) templates is optimized by controlled modification of the sapphire surface termination and by tuning the Cu deposition conditions. Moreover, we find that the Cu layer transforms into an untwinned single-crystalline Cu(111) structure after annealing at typical graphene growth temperatures. This allows for the growth of high-quality graphene by the CVD technique. The findings presented in this paper are an important step forward in the production of wafer scale, single-crystalline graphene.

Bacterial cells are lysed when they attach onto regularly arrayed silicon nanopillars. Following cell lysis, the cell debris detaches from the surface and is released back into the immediate environment which allows for restored bactericidal activity of the substratum.

The key steps of a transfer of two-dimensional (2D) materials are the delamination of the as-grown material from a growth substrate and the lamination of the 2D material on a target substrate. In state-of-the-art transfer experiments, these steps remain very challenging, and transfer variations often result in unreliable 2D material properties. Here, it is demonstrated that interfacial water can insert between graphene and its growth substrate despite the hydrophobic behavior of graphene. It is understood that interfacial water is essential for an electrochemistry-based graphene delamination from a Pt surface. Additionally, the lamination of graphene to a target wafer is hindered by intercalation effects, which can even result in graphene delamination from the target wafer. For circumvention of these issues, a direct, support-free graphene transfer process is demonstrated, which relies on the formation of interfacial water between graphene and its growth surface, while avoiding water intercalation between graphene and the target wafer by using hydrophobic silane layers on the target wafer. The proposed direct graphene transfer also avoids polymer contamination (no temporary support layer) and eliminates the need for etching of the catalyst metal. Therefore, recycling of the growth template becomes feasible. The proposed transfer process might even open the door for the suggested atomic-scale interlocking-toy-brick-based stacking of different 2D materials, which will enable a more reliable fabrication of van der Waals heterostructure-based devices and applications.