The development of composite abrasives considering the cleanability of the polished work piece was previously reported. In glass polishing, composite abrasives exhibit improved polishing characteristics and result in superior cleanability in comparison with conventional polishing compounds. In this study, the application of these composite abrasives to the polishing of stainless alloy, cast iron and sapphire are investigated. New manufacturing methods and polymer particles are proposed for the various material applications. The experimental results show that composite abrasives improve the polishing removal rate for metal and sapphire substrates.

滞留性を考慮した複合砥粒の開発とその研磨特性 ＊The composite abrasives have been developed for improving dispersibility and cleanability of conventional abrasives which are cerium oxide for glass polishing. The composite abrasives consist of polymer particles as mother particles and abrasives as child particles. Child particles are attached to the surface of mother particles by mechanical force. In this study, the effects of stagnation of abrasives on the polishing characteristics are investigated through some experiments. First, polymer particles that include silica particles and polymer particles that have nonspherical shape are employed. When using nonspherical particles, removal rate of polishing using composite abrasives is 50 % higher than that of conventional polishing. Second, the effects of polishing conditions on the polishing characteristics are investigated. Finally, WO 3 particles are added into slurries of composite abrasives after classification. As a result, polishing characteristics of composite abrasives after classification were increased because stagnation of composite abrasives was improved.

Cerium oxide (CeO 2) abrasives are generally used in the glass polishing because high removal rate and smooth glass surface can be obtained. However, CeO 2 abrasives have problems with dispersion of slurry and cleaning from glass surface. The polymer-CeO 2 composite abrasive was developed to improve polishing performance and decrease cleaning time of polished surfaces. The composite abrasive has a core-shell structure which a polymer particle forms a core and a CeO 2 layer covers the polymer particle. In this study, we investigated the effect of polishing pads on polishing characteristics of composite abrasives. First, we investigated the effect of the pore size of polishing pad on the polishing pad on the polishing performance using composite abrasives. We employed three suede type polishing pads for polishing using composite abrasives. The removal rate using suede type pads with average pore size of 20-60 µm was higher than that using suede type pads with other pore sizes. Next, we investigated the effect of pore diameter of porous polishing pads on polishing characteristics using composite abrasives. The removal rate using polishing pads with average pore diameter of 67µm was approximately two times higher than that of polishing using polishing pads with average pore diameter of 250µm. In addition, we investigated the relationship between removal rate and polishing conditions. The removal rate using composite abrasives was higher than 0.8µm/min when concentration of slurry was 3.0wt%. Finally, we employed epoxy resin polishing pads. The polishing characteristics using composite abrasives with epoxy polishing pad were higher than the polishing characteristics using composite abrasives with polyurethane resin polishing pads.

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