The inclusion of plasmonic nanoparticles into organic solar cell enhances the light harvesting properties that lead to higher power conversion efficiency without altering the device configuration. This work defines the consequences of the nanoparticle overloading amount and energy transfer process between gold nanorod and polymer (active matrix) in organic solar cells. We have studied the hole population decay dynamics coupled with gold nanorods loading amount which provides better understanding about device performance limiting factors. The exciton and plasmon together act as an interacting dipole; however, the energy exchange between these two has been elucidated via plasmon resonance energy transfer (PRET) mechanism. Further, the charge species have been identified specifically with respect to their energy levels appearing in ultrafast time domain. The specific interaction of these charge species with respective surface plasmon resonance mode, i.e., exciton to transverse mode of oscillation and polaron pair to longitudinal mode of oscillations, has been explained. Thus, our analysis reveals that PRET enhances the carrier population density in polymer via non-radiative process beyond the concurrence of a particular plasmon resonance oscillation mode and polymer absorption range. These findings give new insight and reveal specifically the factors that enhance and control the performance of gold nanorods blended organic solar cells. This work would lead in the emergence of future plasmon based efficient organic electronic devices.

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This paper describes the impression of low-k/high-k dielectric on the performance of Double Gate Junction less (DG-JL) MOSFET. An analytical model of the threshold voltage of DG-JLFET has been presented. Poisson's equation is solved using the parabolic approximation to find out the threshold voltage. The effect of high-k on various performance parameters of N-type DG-JLFET is explored. The comparative analysis has been carried out between conventional gate oxide, multi oxide and high-k oxide in terms of Drain Induced Barrier Lowering (DIBL), threshold voltage, figure of merit (ION/IOFF) and sub-threshold slope (SS). The high-k oxide has shown superlative performance as compared to others. The results are further analyzed for various device structures. The DG-JLFET with HfO2 exhibits excellent attainment by mitigating the Short Channel Effects (SCEs). The significant reduction in off current makes the device suitable for ultra-low power applications. There is a 61.9 % and 34.29% improvement in the figure of merit and sub-threshold slope in the proposed device as compared to other devices. The simulation of DG-JLFET is carried out using the Silvaco TCAD tool.