In the present work, we investigate systematically the electronic and optical properties of Janus ZrSSe using first-principles calculations. Our calculations demonstrate that the Janus ZrSSe monolayer is an indirect semiconductor at equilibrium. The band gap of the Janus ZrSSe is 1.341 eV using the Heyd-Scuseria-Ernzerhof hybrid functional, larger than the band gap of ZrSe 2 monolayer and smaller than that of ZrS 2 monolayer. Based on the analysis of the band edge alignment, we confirm that the Janus ZrSSe monolayer possesses photocatalytic activities that can be used in water splitting applications.While strain engineering plays an important role in modulating the electronic properties and optical characteristics of the Janus ZrSSe monolayer, the influence of the external electric field on these properties is negligible. The biaxial strain, 3 b , has significantly changed the band of the Janus ZrSSe monolayer, and particularly, the semiconductor-metal phase transition which occurred at 3 b ¼ 7%. The Janus ZrSSe monolayer can absorb light in both visible and ultraviolet regions. Also, the biaxial strain has shifted the first optical gap of the Janus ZrSSe monolayer. Our findings provide additional information for the prospect of applying the Janus ZrSSe monolayer in nanoelectronic devices, especially in water splitting technology.
Two-dimensional
MoSi2N4 is an emerging class
of 2D MA2N4 family, which has recently been
synthesized in experiment. Herein, we construct ultrathin van der
Waals heterostructures between graphene and a new 2D Janus MoGeSiN4 material and investigate their interfacial electronic properties
and tunable Schottky barriers and contact types using first-principles
calculations. The GR/MoGeSiN4 vdWHs are expected to be
energetically favorable and stable. The high carrier mobility in graphene/MoGeSiN4 vdWHs makes them suitable for high-speed nanoelectronic devices.
Furthermore, depending on the stacking patterns, either an n-type
or a p-type Schottky contact is formed at the GR/MoGeSiN4 interface. The strain engineering and electric field can lead to
the transformation from an n-type to a p-type Schottky contact or
from Schottky to Ohmic contact in graphene/MoGeSiN4 heterostructure.
These findings provide useful guidance for designing controllable
Schottky nanodevices based on graphene/MoGeSiN4 heterostructures
with high-performance.
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