Long nanoscale gaps on III-V substrates by electron beam lithography J. Vac. Sci. Technol. B 30, 06F305 (2012); 10.1116/1.4766881Simple fabrication of UV nanoimprint templates using critical energy electron beam lithography

In this study, nanofluidic devices were fabricated using Unity® 4671E, a decomposable, negative tone resist. Cavities as large as 2.5 mm and channels as small as 30 nm were fabricated with the same process. Water was successfully flowed through the devices and the flow was characterized for a 500 nm channel.