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Ultrasonic atomization is used to produce fine liquid mists with diameter ranges below 100nm. We investigated the effect of the frequency on the size distribution of ultrasonic mist. A bimodal distribution was obtained for the mist generated by ultrasonic atomization with a wide-range particle spectrometer. The peak diameter decreased with increasing frequency, and the number concentration of the mist increased in the smaller range. We determined the relation between the size distribution of the mist and the ultrasonic frequency, and we proposed a generation mechanism for the ultrasonic nanosized mist based on the amount of water vapor around the liquid column. Increasing the power intensity and density by changing the surface diameter of the ultrasonic oscillator affected the number concentration and size distribution of the nanosized mist. Using this technique, the diameter of the mist can be controlled by changing the frequency of the ultrasonic transducer.

In order to develop an effective dry surface cleaning method, removal of fine particles by pulse air jets was experimentally investigated. A dimensionless resuspension parameter, F*, which is the ratio of drag force on particles to van der Waals adhesion force, was introduced to correlate the removal efficiency. Resuspension experiments were carried out with monodisperse PSL particles and wax particles with diameter between 0.25 and 1.1 p m on silicon wafer and glass plate. As a result, it was found that deposition process of particles on the surface (gravitational settling and impaction at a relatively low impaction velocity) has little effect on the removal efficiency and that consecutive pulse air jet is effective in the removal of fine particles. Further, F* is the key parameter in determining the removal efficiency. The prediction method for the removal efficiency by pulse air jets with F* is proposed.