No abstract

Ultraviolet nanoimprint lithography (UV-NIL) is the most effective method for the fabrication of antireflection (AR) films. Interface reflection is one of the challenges in AR film fabrication. To apply the fabricated AR film to any surfaces, an adhesive material is needed. However, owing to the difference in refractive index between the AR film and the adhesive material, interface reflection still occurs. Therefore, an AR film that can prevent the reflection at its front and back surfaces was studied. Thus, we proposed the fabrication of a double-sided self-supporting antireflection-structured (DSARS) film. As a result, the reflectivity of the fabricated DSARS film is 0.1% at visible light wavelengths. The DSARS film also suppresses the adhesive interface reflection.

No abstract

In ultraviolet nanoimprint lithography (UV-NIL), the presence of fluorinated components in a release-agent-free antireflection-structured (RAF-ARS) replica mold is an important factor preventing the adhesion of resin on its surface. Nevertheless, a strong release force (RF), which results from the complete filling of resin in a high-aspect-ratio RAF-ARS replica mold during UV-NIL, degrades its fluorinated components and consequently shortens its lifetime. In this paper, we propose a technique for the lifetime amelioration of RAF-ARS replica molds by partial-filling UV-NIL. Complete-filling UV-NIL was also executed for comparison. We also examined the effects of the filling ratio on an RAF-ARS replica mold. Using the partial-filling UV-NIL technique, we successfully prolonged the lifetime of an RAF-ARS replica mold up to the 100th imprint, compared with the 75th imprint in the case of complete-filling UV-NIL.