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VO 2 thin films deposited on fused quartz substrates were successfully fabricated by the pulsed-laser-deposition (PLD) technique. The obtained samples were examined by microscopy and x-ray diffraction (XRD). The films show a fast, passive thermochromic effect of semiconductor-to-metal phase transition (PT) with a characteristic hysterisis at ϳ68°C. The thermochromic effect was measured as resistivity, optical transmission, and reflection versus temperature. Under pulsed laser excitation, an optically induced ultrafast PT of VO 2 thin film was observed. Using the degenerate-four-wave-mixing (DFWM) technique, it was found that excited state dynamics is responsible for the induced lattice reorientation polarization, which results in the ultrafast PT.

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VO 2 thin films deposited on MgO and fused silica glass substrates were prepared by the pulsed laser deposition (PLD) technique, which shows phase transition (PT) from the monoclinic semiconductor phase to a metallic tetragonal rutile structure at temperatures over 68°C. The observed PT is reversible, showing a typical hysteresis. The PT can also be induced through optical pumping by laser excitation. In this case, it was found that the optically induced PT is ultrafast and passive, but not thermally initiated. In order to understand the PT mechanism, a study of transient holography using degenerate-four-wavemixing (DFWM) measurement was conducted. A Nd:YAG pulsed laser with pulse duration of 30 psec operating at 532 nm was employed as the coherent light source. This showed that the observed transient holography in VO 2 thin film is associated with the excited state dynamical process, which essentially causes the structural change, or so-called optically induced PT. The observed extremely large polarizability is believed to relate to the large offset in the potential well minimum between the ground state and excited state. Through an unidentified intermediate state, the transient lattice distortion triggered the structural change.