In this article, electron beam induced changes in the refractive index and film thickness of time relaxed amorphous AsxS100−x (with x=30–45) and AsxSe100−x (with x=40–70) are studied. The largest index change (∼0.08) in AsxS100−x films is found when x=40. The corresponding value (∼0.06) for AsxSe100−x films is met when x=55. The difference in the best compositions is attributed to the different relaxation processes of As–S and As–Se films. Electron beam irradiation causes surface shrinkage of the films. In AsxSe100−x films contractions are deepest (∼75 nm) when x=55.

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