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In this work, we investigate the impact of Si-SiO2 interface traps on the performance of negative capacitance transistor, which is a promising emerging technology that aims at achieving a steep sub-threshold slope. Interface traps induced degradation is well known to be one of the major concerns when it comes to reliability. We focus on investigating the impact of different interface trap concentrations on the figures of merit of both the devices and circuits. Our investigation is performed using TCAD models, which are well calibrated against 14 nm production quality FinFETs. This allows accurate analysis and modeling of the impact of NC on the electric field across the SiO2 layer. Then, the industry compact model of FinFET (BSIM-CMG) is fully calibrated to reproduce TCAD data. In addition, a physics-based NC model is integrated and solved self-consistently within the BSIM-CMG model in which TCAD data of NC-pFinFETs and NC-nFinFETs are also well matched. This allows studying how interface traps induced degradation can impact circuits. Our results demonstrate that the amplified electric field across the SiO2 layer within NC-pFinFET due to NC effect leads to a higher interface trap concentration. This, in turn, results in a larger degradation in the NC-pFinFET compared to its pFinFET counterpart -when both of these devices are operated at the same nominal supply voltage of the 14 nm node. However, at the same interface trap concentration, the NC-pFinFET always exhibits less degradation than the baseline pFinFET due to the former's better electrostatic integrity on account of voltage amplification effect. With respect to circuits, we study both Ring Oscillator (RO) and 6-T SRAM cell circuits. We show how the frequency of RO in the case of NC-FinFET is always less impacted by interface trap induced degradations compared to its counterpart FinFET-based RO. For 6-T SRAM cell, we demonstrate how the key reliability metrics such as hold noise margin, read noise margin, and write noise margin are also less impacted by the induced degradations in NC-FinFET SRAMs compared to the baseline FinFET SRAMs. This is because of the much better electrostatic integrity that NC provides.

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