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An electrostatically controlled flexible mirror has been fabricated on a silicon chip by means of bulk micromachining. The mirror has a 10.5 mm × 10.5 mm square aperture and consists of a 0.5-µm-thick tensile-stressed silicon-nitride diaphragm coated with a 0.2-µm-thick reflective aluminum layer. The reflecting surface is initially plane with a mean-square deviation of ~λ/8 for λ = 633 nm. The shape of the reflecting surface is controlled electrostatically by an array of integrated actuators. Good initial optical quality and the possibility of electrostatic control of the reflecting surface make the on-chip mirror useful for various electro-optical applications.

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In this paper, a new method of photoresist coating, direct spray coating, is studied. This method is especially suited to coat high topography surfaces for some special applications in microelectromechanical systems, radio frequency components and packaging. The most suitable photoresist type and coating process are found. The influence of several coating parameters on the thickness and uniformity of the photoresist layer is investigated. A model describing the dependence of the thickness on the major parameters is presented. Very promising results are obtained using spray coating for the fabrication of several three-dimensional structures.