A direct determination of the Young's modulus and the Poisson's ratio in a 140 nm polycrystalline tungsten thin film deposited by ion-beam sputtering on a polyimide substrate has been performed by coupling x-ray diffraction measurements with in situ tensile testing. The method described in this letter to extract the Young's modulus of thin films from the evolution of the sin 2 ψ curves as a function of applied load only requires to know the substrate Young's modulus. The determination of the thin film Poisson's ratio can be realized without knowing any of the substrate elastic constants. In the case of the tungsten thin film, the obtained Young's modulus was close to the bulk material one whereas the Poisson's ratio was significantly larger than the bulk one.

The size effect on the elastic constants of nanocrystalline tungsten has been investigated in the case of W/Cu multilayers with two modulation wavelengths (3.1 and 24.0 nm). Tungsten Young's modulus and Poisson's ratio have been measured thanks to a technique coupling x-ray diffraction with in situ tensile testing. It is demonstrated that the in-grain thin film elastic constants are highly microstructure -sensitive: in the "3.1 nm" multilayer, tungsten Poisson's ratio is larger than the bulk one while it is smaller in the "24.0 nm" multilayer; a softening of tungsten Young's modulus is evidenced in the case of the specimen with the smallest period.

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