Polyaniline (PANI) protonated with camphorsulfonic acid (CSA) and three different poly(alkylene phosphates) (PAPs) (where alkylene ϭ pentylene, hexylene, or nonylene) was used in the fabrication of conductive polyaniline-poly(methyl methacrylate) (PMMA) blends. The lowest percolation threshold ( f p ϭ 0.041 wt %) was obtained for the PANI(CSA) 0.5 -PMMA blend plasticized with 35 wt % of dibutyl phtalate (DBPh). This blend is also very resistant against the deprotonation of its conductive phase in basic solutions of pH ϭ 9. In the case of blends prepared with the use of PAPs as PANI dopants, the percolation threshold strongly depends on the length of the hydrophobic spacer (alkylene group) in the dopant. The percolation threshold decreases in the order PPP Ͼ PHP Ͼ PNP, whereas the resistance against deprotonation in basic solutions decreases in the following inverse order: PNP Ͼ PHP Ͼ PPP. This last observation can be rationalized by increasing contribution of hydrophobic segments in the polymeric dopant, when going from PPP to PNP, which renders polyaniline more resistance toward the penetration by aqueous basic solutions.