SrTiO3 is a widely used substrate for the growth of other functional oxide thin films. The reactivity of the substrate with respect to the film during deposition, particularly with regard to redox reactions, has typically been glossed over. We demonstrate by depositing a variety of metals (Ti, Al, Nb, Pt, Eu, and Sr) and measuring the in situ core level spectra of both the metal and SrTiO3 that, depending on the oxide formation energy and work function of the metal, three distinct types of behavior occur in thin metal films on SrTiO3 (100). In many cases, there will be an interfacial layer of oxygen-deficient SrTiO3 formed at the interface with the overlying film. We discuss how this may affect the interpretation of the well-known two-dimensional electron gas present at the interface between SrTiO3 and various oxides.

The development of non-volatile logic through direct coupling of spontaneous ferroelectric polarization with semiconductor charge carriers is nontrivial, with many issues, including epitaxial ferroelectric growth, demonstration of ferroelectric switching and measurable semiconductor modulation. Here we report a true ferroelectric field effect-carrier density modulation in an underlying Ge(001) substrate by switching of the ferroelectric polarization in epitaxial c-axis-oriented BaTiO 3 grown by molecular beam epitaxy. Using the density functional theory, we demonstrate that switching of BaTiO 3 polarization results in a large electric potential change in Ge. Aberration-corrected electron microscopy confirms BaTiO 3 tetragonality and the absence of any low-permittivity interlayer at the interface with Ge. The non-volatile, switchable nature of the single-domain out-of-plane ferroelectric polarization of BaTiO 3 is confirmed using piezoelectric force microscopy. The effect of the polarization switching on the conductivity of the underlying Ge is measured using microwave impedance microscopy, clearly demonstrating a ferroelectric field effect.

a b s t r a c tHigh-quality epitaxial BaTiO 3 (BTO) on Si has emerged as a highly promising material for future electrooptic (EO) devices based on BTO's large effective Pockels coefficient. We report on the EO response of BTO films deposited on Si by molecular beam epitaxy (MBE), and characterize the structure of these films by reflection high-energy electron diffraction and X-ray diffraction. O 2 rapid thermal anneal at 600°C for 30 min ensures full oxidation of BTO for minimal leakage current with minimal change in crystalline structure.

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In recent years, research on Ge nanodevices has experienced a renaissance, as Ge is being considered a possible high mobility channel material replacement for Si MOSFET devices. However, for reliable high performance devices, an atomically flat and perfectly clean Ge surface is of utmost importance. In this review, the existing methods for cleaning the Ge(001) surface are reviewed and compared for the first time. The review discusses three broad categories of cleaning techniques that have been successfully demonstrated to obtain a clean Ge surface. First, the use of ultraviolet light and/or oxygen plasma is discussed. Both techniques remove carbon contamination from the Ge surface and simultaneously form an oxide passivation layer. Second, in situ ion sputtering in combination with germanium regrowth, which can lead to extremely clean and well-ordered Ge surfaces, is discussed. Finally, various wet-etching recipes are summarized, with focus on hydrofluoric acid (HF), NH4OH, and HCl. Despite the success of HF for Si surface preparation, it is demonstrated that in the case of Ge, HF is outperformed by other chemicals with respect to surface roughness, carbon and oxide removal efficiency. It is shown that several cleaning methods can lead to a perfectly clean Ge surface, but only a few methods can be considered for actual device integration due to their effectiveness, simplicity, and scaling ability.