The computer program PC1 D is widely used for modeling crystalline solar cells. This paper describes a new version of the program which takes advantage of the latest graphical environments of personal computers to offer improved visualization of cell design and operation, simpler comparison of experimental data with simulation results, greatly increased calculation speed, and improved models for generation and recombination effects. We demonstrate the use of some of these features to explore the importance of trap-assisted tunneling at heavily doped junctions in material with low carrier lifetime, as is often encountered in thin polycrystalline silicon cells.
New experimental data for the minority-carrier surface recombination velocity of n-type silicon, Sp, are reported. The data, obtained from photoconductance decay measurements of the recombination currents corresponding to different phosphorus diffusions, include oxide-passivated, unpassivated and metal-coated surfaces. For the passivated case, Sp increases linearly with surface dopant density, ND, for dopant densities higher than 1×1018 cm−3, while for unpassivated (bare) and for metal-coated silicon Sp remains essentially constant, at about 2×105 cm/s and 3×106 cm/s, respectively. The experiments also allow for a determination of the apparent energy bandgap narrowing as a function of dopant density, ΔEgapp=14 meV [ln(ND/1.4×1017 cm−3)]. These surface recombination velocity and ΔEgapp data form, together with the dependences of minority-carrier lifetime, τp, and mobility, μp, used in the analysis, a consistent set of parameters that fully characterize highly doped n-type silicon.
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