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We have developed improved analyzer multilayers for the detection of aluminium (Al) and boron (B) on silicon (Si) wafers with wavelength-dispersive x-ray fluorescence spectrometers. For the detection of Al on Si wafers we show that WSi(2)/Si and Ta/Si multilayers provide detection limits that are 42% and 60% better, respectively, than with currently used W/Si multilayers. For the detection of B on Si wafers we show that La/B(4)C multilayers improve the detection limit by approximately 28% compared with a conventionally used Mo/B(4)C multilayer.

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No abstract