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Hydrofluoroethers are shown to be benign solvents for a wide variety of organic electronic materials, even at extreme conditions such as boiling temperature (see figure). Coupled with fluorous functional materials they open new frontiers for “green” materials processing that can be readily adopted by industry.

The concept of chemical orthogonality has long been practiced in the field of inorganic semiconductor fabrication, where it is necessary to deposit and remove a layer of photoresist without damaging the underlying layers. However, these processes involving light sensitive polymers often damage organic materials, preventing the use of photolithography to pattern organic electronic devices. In this article we show that new photoresist materials that are orthogonal to organics allow the fabrication of complex devices, such as hybrid organic/inorganic circuitry and full-colour organic displays. The examples demonstrate that properly designed photoresists enable the fabrication of organic electronic devices using existing infrastructure. Results and discussionAs a first target, we fabricated top-contact OTFTs having channel lengths which are difficult to achieve with conventional

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An acid-sensitive semiperfluoroalkyl resorcinarene was synthesized, and its lithographic properties were evaluated. Its solubility in segregated hydrofluoroether solvents enables the patterning of delicate organic electronic materials.