We report high performance ultraviolet (UV) photodetectors (PDs) based on p-GaN-gated AlGaN/GaN heterostructures grown on silicon substrates. Benefitting from the high electrical gain resulting from the transistor-like operation of the device, a photocurrent as high as 4.8 mA/mm was achieved with UV illumination. Due to the effective depletion of the two-dimensional electron gas at the AlGaN/GaN heterointerface via a p-GaN optical gate, the dark current was suppressed to below 3 × 10−8 mA/mm. A high photo-to-dark current ratio over 108 and a high responsivity of 2 × 104 A/W were demonstrated in the device. Moreover, with a cutoff wavelength of 395 nm, the PDs exhibited an ultrahigh UV-to-visible rejection ratio of over 107. Limited by a persistent photoconductivity effect, the rise time and fall time of the device frequency response were measured to be 12.2 ms and 8.9 ms, respectively. The results suggest the potential of the proposed PDs for high-sensitivity UV detection.
In this letter, we report the first demonstration of monolithically integrated ultraviolet (UV) light emitting diodes (LEDs) and visible-blind UV photodetectors (PDs) employing the same p-GaN/AlGaN/GaN epi-structures grown on Si. Due to the radiative recombination of holes from the p-GaN layer with electrons from the 2-D electron gas (2DEG) accumulating at the AlGaN/GaN heterointerface, the forward biased LED with p-GaN/AlGaN/GaN junction exhibits uniform light emission at 360 nm. Facilitated by the high-mobility 2DEG channel governed by a p-GaN optical gate, the visible-blind phototransistor-type PDs show a low dark current of ∼10−7 mA/mm and a high responsivity of 3.5×105 A/W. Consequently, high-sensitivity photo response with a large photo-to-dark current ratio of over 106 and a response time less than 0.5 s is achieved in the PD under the UV illumination from the on-chip adjacent LED. The demonstrated simple integration scheme of high-performance UV PDs and LEDs shows great potential for various applications such as compact opto-isolators.
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