The influences of sputtering gas pressure on the high-frequency magnetization dynamics of as-sputtered CoFeB thin films are studied with permeability spectra based on the Landau-Lifshitz-Gilbert (LLG) equation. Results show that with the pressure increasing, both the anisotropy field and resonance frequency have minimums, while the initial permeability shows a maximum. The damping factor deceases monotonously with the pressure increasing, similar as with the coercivity. The high tunability of the damping factor indicates that controlling sputtering gas pressure could be an effective method in tuning the magnetization dynamics. All these dependences on gas pressure are suggested to be related to the inner stress of these sputtered films.

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