No abstract

A new illumination system for mask aligner lithography is presented. The illumination system uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is located in the Fourier plane of the first. The new illumination system uncouples the illumination light from the light source and provides excellent uniformity of the light irradiance and the angular spectrum. Spatial filtering allows to freely shape the angular spectrum to minimize diffraction effects in contact and proximity lithography. Telecentric illumination and ability to precisely control the illumination light allows to introduce resolution enhancement technologies (RET) like customized illumination, optical proximity correction (OPC) and source-mask optimization (SMO) in mask aligner lithography.

No abstract

The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithography in a mask aligner. A novel illumination system, referred to as MO Exposure Optics, allows to control the effective source shape and accordingly the angular spectrum of the illumination light. Pinhole array photomasks are employed to generate periodic high-resolution diffraction patterns by means of self-imaging. They create a demagnified image of the effective source geometry in their diffraction pattern which is printed to photoresist. The proposed method comprises high flexibility and sub-micron resolution at large proximity gaps. Various periodic structures have been generated and are presented.

Two different approaches for ultra flat image acquisition sensors on the basis of artificial compound eyes are examined. In apposition optics the image reconstruction is based on moiré-or static sampling while the superposition eye approach produces an overall image. Both types of sensors are compared with respect to theoretical limitations of resolution, sensitivity and system thickness. Explicit design rules are given. A paraxial 3x3 matrix formalism is used to describe the arrangement of three microlens arrays with different pitches to find first order parameters of artificial superposition eyes. The model is validated by analysis of the system with raytracing software. Measurements of focal length of anamorphic reflow lenses, which are key components of the superposition approach, under oblique incidence are performed. For the second approach, the artificial apposition eye, a first demonstrator system is presented. The monolithic device consists of a UV-replicated reflow microlens array on a thin silica-substrate with a pinhole array in a metal layer on the backside. The pitch of the pinholes differs from the lens array pitch to enable an individual viewing angle for each channel. Imaged test patterns are presented and measurements of the angular sensitivity function are compared to calculations using commercial raytracing software.