We demonstrate an all-fiber supercontinuum source that generates a continuous spectrum from 1.6 μm to >11  μm with 417 mW on-time average power at 33% duty cycle. By utilizing a master oscillator power amplifier pump with three amplification stages and concatenating solid core ZBLAN, arsenic sulfide, and arsenic selenide fibers, we shift 1550 nm light to ∼4.5  μm, ∼6.5  μm, and >11  μm, respectively. With 69 mW past 7.5 μm, this source provides both high power and broad spectral expansion, while outputting a single fundamental mode.

Epsilon-near-zero (ENZ) materials, when probed at or near wavelengths corresponding to their zero permittivity crossing points, have unique and interesting properties that can be exploited for enhancing nanoscale light−matter interactions. Here, we experimentally show that over an order of magnitude increase in the absorption band of a periodically patterned metal− dielectric−metal structure can be obtained by integrating an indium tin oxide (ITO) subwavelength nanolayer into the insulating dielectric gap region. Through incorporation of a 12 nm thick ITO layer between the patterned gold nanodisks and the SiO 2 dielectric layer, a 240 nm wide, flat-top perfect (>98%) absorption centered at 1550 nm wavelength is enabled. The demonstrated wideband, perfect absorption resonance is shown to be due to coupling between the gap plasmon mode of the metasurface and the ENZ mode in the nanoscale ITO film.

Controlling the propagation of optical fields in three dimensions using arrays of discrete dielectric scatterers is an active area of research. These arrays can create optical elements with functionalities unrealizable in conventional optics. Here, we present an inverse design method based on the inverse Mie scattering problem for producing three-dimensional optical field patterns. Using this method, we demonstrate a device that focuses 1.55-μm light into a depth-variant discrete helical pattern. The reported device is fabricated using two-photon lithography and has a footprint of 144 μm by 144 μm, the largest of any inverse-designed photonic structure to date. This inverse design method constitutes an important step toward designer free-space optics, where unique optical elements are produced for user-specified functionalities.