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Articles you may be interested inA scatterometer for measuring the bidirectional reflectance and transmittance of semiconductor wafers with rough surfaces Rev. Sci. Instrum. 74, 4885 (2003);We introduce a method of measuring the surface profile of etched facets on semiconductor lasers, giving direct, quantitative results. Unlike previous techniques which attempt to infer facet quality from electro-optic performance or subjective analysis of micrographs, this technique provides the actual facet profile. We show how this information can be used for process improvement, and accurate numerical simulation of facet reflectivity.

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