Silica and hybrid organic-inorganic films, ca. 100-200 nm thick, can be grown on glassy carbon electrodes through reactions initiated by electrogenerated hydroxide or hydronium ions in water under reductive and oxidative conditions, respectively. A variety of different alkoxysilanes (tetramethoxysilane and organoalkoxysilanes) and supporting electrolytes were used to evaluate whether film formation takes place on glassy carbon electrodes. The results of the study indicate that the acid-base properties of the supporting electrolyte are an important factor in determining whether film formation will take place. For cathodic electrodeposition, thin films can be formed using supporting electrolytes that are close to neutral, such as KCl, KNO3, and NaClO4. For anodic electrodeposition, thin films can be formed using supporting electrolytes that are acidic, such as, KH2PO4, HNO3, H2SO4, etc. The acidity/basicity effects of the electrolytes arise in part from the strong dependence of the hydrolysis and condensation rates of the silicon alkoxide precursors on pH.