No abstract

We describe how the Bi content of GaAs 1−x Bi x epilayers grown on GaAs can be controlled by the growth conditions in molecular beam epitaxy. Nonstandard growth conditions are required because of the strong tendency for Bi to surface segregate under usual growth conditions for GaAs. A maximum Bi content of 10% is achieved at low substrate temperature and low arsenic pressure, as inferred from x-ray diffraction measurements. A model for bismuth incorporation is proposed that fits a large body of experimental data on Bi content for a wide range of growth conditions. Low growth rates are found to facilitate the growth of bismide alloys with a low density of Bi droplets.

Room temperature photoluminescence ͑PL͒ spectra have been measured for GaAs 1−x Bi x alloys with Bi concentrations in the 0.2%-10.6% range. The decrease in the PL peak energy with increasing Bi concentration follows the reduction in bandgap computed from density functional theory. The PL peak energy is found to increase with PL pump intensity, which we attribute to the presence of shallow localized states associated with Bi clusters near the top of the valence band. The PL intensity is found to increase with Bi concentration at low Bi concentrations, peaking at 4.5% Bi.

The incorporation of Bi is investigated in the molecular beam epitaxy growth of GaAs 1Àx Bi x. Bi content increases rapidly as the As 2 :Ga flux ratio is lowered to 0.5 and then saturates for lower flux ratios. Growth under Ga and Bi rich conditions shows that Bi content increases strongly with decreasing temperature. A model is proposed where Bi from a wetting layer incorporates through attachment to Ga-terminated surface sites. The weak Ga-Bi bond can be broken thermally, ejecting Bi back into the wetting layer. Highly crystalline films with up to 22% Bi were grown at temperatures as low as 200 C. V

The flexibility and quasi-one-dimensional nature of nanowires offer wide-ranging possibilities for novel heterostructure design and strain engineering. In this work, we realize arrays of extremely and controllably bent nanowires comprising lattice-mismatched and highly asymmetric core-shell heterostructures. Strain sharing across the nanowire heterostructures is sufficient to bend vertical nanowires over backward to contact either neighboring nanowires or the substrate itself, presenting new possibilities for designing nanowire networks and interconnects. Photoluminescence spectroscopy on bent-nanowire heterostructures reveals that spatially varying strain fields induce charge carrier drift toward the tensile-strained outside of the nanowires, and that the polarization response of absorbed and emitted light is controlled by the bending direction. This unconventional strain field is employed for light emission by placing an active region of quantum dots at the outer side of a bent nanowire to exploit the carrier drift and tensile strain. These results demonstrate how bending in nanoheterostructures opens up new degrees of freedom for strain and device engineering.