In this work we present the way of ferromagnetic films study by means of magneto-ellipsometry. The method of Magneto-optical Kerr effect interpretation of in situ magneto-optical ellipsometry spectra for real time growth control is described. The Ellipsometry method has been successfully tested on Si/SiO /Fe films within the model of a homogeneous semi-infinite 2 In situ measurements medium. As a result, the dielectric tensor components for Fe layer were calculated using a developed approach.

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In this work we report on new magneto-ellipsometry set-up that allows to grow thin films and nanostructures by ultrahigh vacuum thermal evaporation as well as to conduct in situ measurements during the growth in order to analyse and control nanostructures properties. Ellipsometry and transverse magneto-optical Kerr effect measurements can be performed in situ inside this set-up. A uniform magnetic field of high intensity (more than 1 kOe) can be applied to samples inside the vacuum chamber. Also, we report on the developed method of data interpretation that is the base of the set-up software. Thus, we present a powerful tool for nanostructures synthesis and characterization.