Silicate oxyapatite La9.33(SiO6)4O2:A
(A = Eu3+,
Tb3+ and/or
Ce3+)
phosphor films and their patterning were fabricated by a sol–gel process combined
with soft lithography. X-ray diffraction(XRD), Fourier transform infrared
spectroscopy, atomic force microscopy, optical microscopy and photoluminescence
spectra, as well as lifetimes, were used to characterize the resulting films. The results
of XRD indicated that the films began to crystallize at 800 °C
and the crystallinity increased with the increase in annealing temperatures.
Transparent nonpatterned phosphor films were uniform and crack-free, which
mainly consisted of rodlike grains with a size between 150 and 210 nm.
Patterned thin films with different bandwidths(20, 50µm) were
obtained by the micromoulding in capillaries technique. The doped rare earth ions(Eu3+, Tb3+ and
Ce3+)
showed their characteristic emission in crystalline La9.33(SiO6)4O2
phosphor films, i.e. Eu3+5D
0 −−7F
J(J = 0, 1, 2, 3, 4), Tb3+5D
3,4 −−7F
J(J = 3, 4, 5, 6)
and Ce3+ 5d(2D)−− 4f(2F
2/5,2F
2/7)
emissions, respectively. Both the lifetimes and PL intensity of the Eu3+, Tb3+ ions
increased with increasing annealing temperature from 800 to 1100 °C,
and the optimum concentrations for Eu3+, Tb3+
were determined to be 9 and 7 mol% of La3+ in La9.33(SiO6)4O2
films, respectively. An energy transfer from Ce3+ to
Tb3+
was observed in the La9.33(SiO6)4O2:Ce,
Tb phosphor films, and the energy transfer efficiency was estimated as a function of Tb3+
concentration.