Boron doped Si/SiO2/substrate (Si:B) structure with subwavelength grating on the top Si:B layer was studied by spectroscopic ellipsometry and photoluminescence spectroscopy at room temperature. A clear modification of the dielectric function was observed after reactive ion etching of the top Si:B layer subjected to laser lithography to make a subwavelength grating with high precision. A striking feature of the dielectric function of the grated surface layer is a sharp and intense peak at the energy of 2.968 eV in the interband density of states. Emission band with a remarkable peak structure that emerges in the photoluminescence spectrum of the grated multilayer structure at and below the last energy is absent on pure or boron doped Si. The obtained results are discussed in terms of the G-doping effect in the considered surface grated multilayer structure.

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In the given paper, the temperature dependences ([Formula: see text]–300 K) of the green band intensity at wavelengths [Formula: see text] nm and [Formula: see text] nm have been measured and observed, respectively, from the polished and unpolished surface (PS and unPS) of a polycrystalline CVD (chemical vapor deposition) ZnSe sample upon excitation by X-ray quanta ([Formula: see text]. In both cases, the activation energy of thermal quenching has been determined, and the reasons for thermal quenching have been considered in detail. Along with XRL spectra analysis, the temperature behavior of the green band observed upon excitation by an ultraviolet (UV) laser (He–Cd, [Formula: see text] nm) from the PS and unPS in the temperature range [Formula: see text]–200 K has been discussed in more detail.