This paper reports on work in progress towards developing a control oriented modeling methodology for plasma enhanced chemical vapor deposition (PECVD) processes with an emphasis on spatial deposition rate uniformity. Our strategy contains three components: 1) a detailed computational model, 2) a control oriented reduced order model with an associated uncertainty model, and 3) experiments. Our computational model is based on the software package FLUENT, and as a preliminary result we distinguish two types of deposition rate nonuniformities. The reduced order model is derived using a Galerkin method and an associated uncertainty model is derived using a maximum principle.